Expert Details

Expert in Microelectronics Processing and Contamination Control, Cleanrooms, Particulates, Ultra High Purity

Expert ID: 714244 New Mexico, USA

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Expert has twenty years of research experience in semiconductor technology in major industrial laboratories. This, combined with his expertise gained by fifteen years managing microelectronics laboratories where he performed semiconductor fabrication research at two major universities (Minnesota and Arizona), makes him ideally suited to bringing new approaches to solving semiconductor manufacturing problems. He has consulted in industry on yield management issues and is an expert on contamination control and trace gas contamination issues (ppm vs. ppb vs. ppt). He worked as a Senior Quality Engineer for IBM and performed original research in silicon and III-V epitaxy at David Sarnoff Laboratories. He is an expert in CMOS fabrication and oxide evaluation.

Currently active in the new field MEMS (Micro Electro Mechanical Systems), he explores improvements to large aperture telescopes (CFH Hawaii, four meter at Kit Peak) using deformable mirror and adaptive seeing technologies.

Expert is very knowledgeable in the specialized purification, distribution, and analysis of high purity semiconductor grade chemicals, bulk and specialty gases for high technology applications. He is knowledgeable of "ultra clean" preparation of gate oxide and epitaxial growth surfaces.

He has built several ultra "Class 1" cleanroom facilities for advanced semiconductor R&D. He is also active in the contamination control research community.

Expert works well with attorneys on intellectual property issues and has extensive experience in Federal Court for high technology litigation as an expert witness. He performs both on-site and off-site consulting activities, both in the U.S. and abroad.

Expert may consult nationally and internationally, and is also local to the following cities: Albuquerque, New Mexico - Rio Rancho, New Mexico

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Education

Year Degree Subject Institution
Year: 1976 Degree: no degree Subject: Advanced Work in Materials Science Institution: University of Pennsylvania Graduate School of Metallurgy and Materials Science
Year: 1974 Degree: B.S. Subject: Chemistry Institution: St. Joseph

Work History

Years Employer Title Department Responsibilities
Years: 2000 to Present Employer: Undisclosed Title: Principal Researcher Department: (Undisclosed) Responsibilities: Expert serves as an expert technical witness in intellectual property cases and has done so in cases involving Intel, UMC, and others. He is knowledgeable of CMOS processing and contamination control issues. He is a consultant and an "owner's representative" for facility construction issues.
Years: 1975 to 1997 Employer: (Undisclosed) Title: President Department: (Undisclosed) Responsibilities: He provided technical consulting for semiconductor manufactors.
Years: 1989 to 1995 Employer: (Undisclosed) Title: Research Engineer and Manager, Microelectronics Laboratory Department: Department of Electrical and Computer Engineering Responsibilities: Expert worked in the microelectronics laboratory processing research and ultra high purity metrology, ppb to ppt levels, particulate contamination control. He was a principal investigator on research contracts.
Years: 1981 to 1989 Employer: (Undisclosed) Title: Research Fellow & Manager, Microelectronics Research Lab Department: Department of Electrical Engineering Responsibilities: He conducted research on semiconductor processing and contamination control. He performed industrial and governmental technology consulting.
Years: 1978 to 1979 Employer: (Undisclosed) Title: Senior Associate Quality Engineer Department: Semiconductor Responsibilities: Expert worked on quality assurance of advanced technology; "alpha" line qualification; analysis of field failures and relationship to quality thresholds; advanced on-line sampling techniques; and had on-line visual inspection responsibility.
Years: 1968 to 1975 Employer: (Undisclosed) Title: Research Associate Department: David Sarnoff Research Center Responsibilities: He worked in III-V epitaxial growth, device fabrication, new semiconductor materials preparation and evaluation, and laser fabrication and evaluation.

International Experience

Years Country / Region Summary
Years: 1986 to Present Country / Region: Argentina Summary: Expert is a consultant for United Nations Industrial Development Organization (UNIDO).
Years: 1984 to Present Country / Region: Syria Summary: He is a consultant for UNIDO.
Years: 1984 to Present Country / Region: Egypt Summary: He is a consultant for UNIDO.
Years: 1985 to Present Country / Region: Iraq Summary: He is a consultant for UNIDO.
Years: 1985 to Present Country / Region: Tunisia Summary: He is a consultant for UNIDO.

Career Accomplishments

Associations / Societies
Expert is a senior member of the Institute of Electrical and Electronics Engineers (IEEE) and the Institute of Environmental Sciences (IES). He is a member of the American Chemical Society (ACS), Materials Research Society (Expert), American Association for the Advancement of Science (AAAS) and the Sierra Club. He is a past member of the Minnesota Microelectronics Laboratory Group (MMLG), the Minnesota Semiconductor Safety Association (MSSA), and the Atmospheric Pressure Ionization Mass Spectroscopy Users Group (APIMS).
Professional Appointments
He is a reviewer for the National Science Foundation, Electron Device Letters, Journal of Electrochemical Society, and The Center for Indoor Air Research.
Awards / Recognition
Expert has been honored as a Chemist and Electrical Engineer in Who's Who of Contemporary Achievement, Who's Who in the World, Who's Who in America, Who's Who in Science and Engineering, Who's Who in the West, and Who's Who in the Midwest. He received the Outstanding Mentor Award from the Twin Cities Career Beginnings Program and was awarded a David Sarnoff Scholarship.
Publications and Patents Summary
He has published numerous referred technical papers and conference proceedings and has received four patents.

Additional Experience

Expert Witness Experience
Expert has been an expert witness (State, Federal, and International Trade Commission) regarding CMOS and associated advanced technologies. He has provided expert testimony for United Microelectronics Corporation (UMC,) Intel, Silicon Integrated Systems (SIS), National Semiconductor, Linear Technology Corporation, VTC Inc., Empak, and Honeywell, Inc, and others. He has been retained by the law firms of Wilson, Soncini, Goodrich, and Rosati (Palo Alto), Law+ (Cupertino), and Briggs & Morgan (St. Paul, MN) as an expert witness involving high technology intellectual property cases.

Cases:

I.
Responsibilities: Expert in insurance claims resulting from explosion fabricating semiconductor chemicals. Ongoing issues as of August 2015

II.
Responsibilities: A testifying expert witness; September 2014.
As expert, performed research, wrote expert report, responded to several motions, retained as an testifying expert witness. Trial July 2015

III.
Responsibilities: A testifying expert witness; September 2009.
As consultant, performed research, wrote several expert reports, responded to several motions, retained as an testifying expert witness. Trial September 2009, case lost

IV.
Responsibilities: As consultant, performed research, retained as an expert witness, not disclosed. Trial July 2006. case won

V.
Responsibilities: Research and prepare successful appeal argument presented to German Patent office after original rejection of application. August 2004 successfully completed

VI.
Responsibilities: Technical research and expert analysis. August 2004, negotiation completed successfully

VII.
Responsibilities: Technology research, sample analysis and preparation for trial, expert report, deposition defense and trial analysis. December 2001, case settled

VIII.
Responsibilities: Covered by Protective Order “I will not consult concerning the subject of SOG inter-metal dielectric planarization for a three year period commencing today” prepared expert report, was deposed, provided technical analysis. 1996-1997, case completed

IX.
Responsibilities: Technical patent research, prepared expert report, was deposed. August 1985, case settled after expert's deposition

X.
Responsibilities: Technical consultant and testifying expert witness. February 1985, case won
Training / Seminars
He presented an APIMS (Atmospheric Pressure Ionization Mass Spectroscopy) short course with along with international instructors. He also taught a section of an aerosol and particle measurement course at the Particle Technology Laboratory, Department of Mechanical Engineering, University of Minnesota, for nine years.
Vendor Selection
Expert has experience locating vendors of: all semiconductor processing technologies, semiconductor equipment, specialized analytical instruments for semiconductor evaluation, and cleanroom products and contractors.

He has access to the following resources: print materials and personal contacts.
Other Relevant Experience
He consults for major semiconductor manufacturers such as Intel as well as the United Nations Industrial Development Organization (UNIDO). Expert's consulting client list includes: Air Products and Chemicals, AT&T, Baxter Healthcare, Digital, Hughes/GM, IBM, Intel Corporation, Menasha Corporation, Motorola, Northern Telecom, Control Data Corporation, Rosemount Engineering, Fellows Corporation, and others. In addition, he has a broad knowledge of PMOS, NMOS, CMOS, and fabrication technology.

Language Skills

Language Proficiency
German Has a rough knowledge of German.
French Has a rough knowledge of French.

Fields of Expertise

semiconductor device manufacturing, gas trace analysis, microelectronics science, semiconductor material processing, advanced material processing, contamination control, clean room, ultra high purity, pilot line, wedge bonding, gate oxide, defect control, mass spectroscope, thin-film processing, instrumentation (equipment), clean room contamination detection, clean room design, micro electrical-mechanical system, temperature sensor, thin-film technology, electrical insulation material, complementary metal-oxide semiconductor device, complementary metal-oxide semiconductor integrated circuit, group IVA element, flow-injection analysis, very large-scale integration, vacuum measurement, ion implantation, very high-speed integration, gas analysis, vacuum system, negative metal-oxide semiconductor material, positive metal-oxide semiconductor material, metal-oxide semiconductor material, gallium arsenide semiconductor, construction, X-ray diffraction analysis, vacuum deposition, phase equilibrium, semiconductor ion implantation, zone melting, ultra-high vacuum, transistor, thin film, thin-film capacitor, sputter deposition, semiconductor device, photoresist, ultraviolet lithography, passive solid-state component, optical microscope, non-crystalline structure, microlithography, microcontamination control, mass spectrometry, interphase diffusion, epitaxial reactor, electronics manufacturing, electron microscopy, solid electric property, solid diffusion, crystalline structure, construction safety, chemical equilibrium, bipolar integrated circuit

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