Expert in Microelectronics Processing and Contamination Control, Cleanrooms, Particulates, Ultra High Purity
Expert ID: 714244 New Mexico, USA
Currently active in the new field MEMS (Micro Electro Mechanical Systems), he explores improvements to large aperture telescopes (CFH Hawaii, four meter at Kit Peak) using deformable mirror and adaptive seeing technologies.
Expert is very knowledgeable in the specialized purification, distribution, and analysis of high purity semiconductor grade chemicals, bulk and specialty gases for high technology applications. He is knowledgeable of "ultra clean" preparation of gate oxide and epitaxial growth surfaces.
He has built several ultra "Class 1" cleanroom facilities for advanced semiconductor R&D. He is also active in the contamination control research community.
Expert works well with attorneys on intellectual property issues and has extensive experience in Federal Court for high technology litigation as an expert witness. He performs both on-site and off-site consulting activities, both in the U.S. and abroad.
Expert may consult nationally and internationally, and is also local to the following cities: Albuquerque, New Mexico - Rio Rancho, New Mexico
|Year: 1976||Degree: no degree||Subject: Advanced Work in Materials Science||Institution: University of Pennsylvania Graduate School of Metallurgy and Materials Science|
|Year: 1974||Degree: B.S.||Subject: Chemistry||Institution: St. Joseph|
|Years: 2000 to Present||Employer: Undisclosed||Title: Principal Researcher||Department: (Undisclosed)||Responsibilities: Expert serves as an expert technical witness in intellectual property cases and has done so in cases involving Intel, UMC, and others. He is knowledgeable of CMOS processing and contamination control issues. He is a consultant and an "owner's representative" for facility construction issues.|
|Years: 1975 to 1997||Employer: (Undisclosed)||Title: President||Department: (Undisclosed)||Responsibilities: He provided technical consulting for semiconductor manufactors.|
|Years: 1989 to 1995||Employer: (Undisclosed)||Title: Research Engineer and Manager, Microelectronics Laboratory||Department: Department of Electrical and Computer Engineering||Responsibilities: Expert worked in the microelectronics laboratory processing research and ultra high purity metrology, ppb to ppt levels, particulate contamination control. He was a principal investigator on research contracts.|
|Years: 1981 to 1989||Employer: (Undisclosed)||Title: Research Fellow & Manager, Microelectronics Research Lab||Department: Department of Electrical Engineering||Responsibilities: He conducted research on semiconductor processing and contamination control. He performed industrial and governmental technology consulting.|
|Years: 1978 to 1979||Employer: (Undisclosed)||Title: Senior Associate Quality Engineer||Department: Semiconductor||Responsibilities: Expert worked on quality assurance of advanced technology; "alpha" line qualification; analysis of field failures and relationship to quality thresholds; advanced on-line sampling techniques; and had on-line visual inspection responsibility.|
|Years: 1968 to 1975||Employer: (Undisclosed)||Title: Research Associate||Department: David Sarnoff Research Center||Responsibilities: He worked in III-V epitaxial growth, device fabrication, new semiconductor materials preparation and evaluation, and laser fabrication and evaluation.|
|Years||Country / Region||Summary|
|Years: 1986 to Present||Country / Region: Argentina||Summary: Expert is a consultant for United Nations Industrial Development Organization (UNIDO).|
|Years: 1984 to Present||Country / Region: Syria||Summary: He is a consultant for UNIDO.|
|Years: 1984 to Present||Country / Region: Egypt||Summary: He is a consultant for UNIDO.|
|Years: 1985 to Present||Country / Region: Iraq||Summary: He is a consultant for UNIDO.|
|Years: 1985 to Present||Country / Region: Tunisia||Summary: He is a consultant for UNIDO.|
|Associations / Societies|
|Expert is a senior member of the Institute of Electrical and Electronics Engineers (IEEE) and the Institute of Environmental Sciences (IES). He is a member of the American Chemical Society (ACS), Materials Research Society (Expert), American Association for the Advancement of Science (AAAS) and the Sierra Club. He is a past member of the Minnesota Microelectronics Laboratory Group (MMLG), the Minnesota Semiconductor Safety Association (MSSA), and the Atmospheric Pressure Ionization Mass Spectroscopy Users Group (APIMS).|
|He is a reviewer for the National Science Foundation, Electron Device Letters, Journal of Electrochemical Society, and The Center for Indoor Air Research.|
|Awards / Recognition|
|Expert has been honored as a Chemist and Electrical Engineer in Who's Who of Contemporary Achievement, Who's Who in the World, Who's Who in America, Who's Who in Science and Engineering, Who's Who in the West, and Who's Who in the Midwest. He received the Outstanding Mentor Award from the Twin Cities Career Beginnings Program and was awarded a David Sarnoff Scholarship.|
|Publications and Patents Summary|
|He has published numerous referred technical papers and conference proceedings and has received four patents.|
|Expert Witness Experience|
| Expert has been an expert witness (State, Federal, and International Trade Commission) regarding CMOS and associated advanced technologies. He has provided expert testimony for United Microelectronics Corporation (UMC,) Intel, Silicon Integrated Systems (SIS), National Semiconductor, Linear Technology Corporation, VTC Inc., Empak, and Honeywell, Inc, and others. He has been retained by the law firms of Wilson, Soncini, Goodrich, and Rosati (Palo Alto), Law+ (Cupertino), and Briggs & Morgan (St. Paul, MN) as an expert witness involving high technology intellectual property cases.
Responsibilities: Expert in insurance claims resulting from explosion fabricating semiconductor chemicals. Ongoing issues as of August 2015
Responsibilities: A testifying expert witness; September 2014.
As expert, performed research, wrote expert report, responded to several motions, retained as an testifying expert witness. Trial July 2015
Responsibilities: A testifying expert witness; September 2009.
As consultant, performed research, wrote several expert reports, responded to several motions, retained as an testifying expert witness. Trial September 2009, case lost
Responsibilities: As consultant, performed research, retained as an expert witness, not disclosed. Trial July 2006. case won
Responsibilities: Research and prepare successful appeal argument presented to German Patent office after original rejection of application. August 2004 successfully completed
Responsibilities: Technical research and expert analysis. August 2004, negotiation completed successfully
Responsibilities: Technology research, sample analysis and preparation for trial, expert report, deposition defense and trial analysis. December 2001, case settled
Responsibilities: Covered by Protective Order “I will not consult concerning the subject of SOG inter-metal dielectric planarization for a three year period commencing today” prepared expert report, was deposed, provided technical analysis. 1996-1997, case completed
Responsibilities: Technical patent research, prepared expert report, was deposed. August 1985, case settled after expert's deposition
Responsibilities: Technical consultant and testifying expert witness. February 1985, case won
|Training / Seminars|
|He presented an APIMS (Atmospheric Pressure Ionization Mass Spectroscopy) short course with along with international instructors. He also taught a section of an aerosol and particle measurement course at the Particle Technology Laboratory, Department of Mechanical Engineering, University of Minnesota, for nine years.|
| Expert has experience locating vendors of: all semiconductor processing technologies, semiconductor equipment, specialized analytical instruments for semiconductor evaluation, and cleanroom products and contractors.
He has access to the following resources: print materials and personal contacts.
|Other Relevant Experience|
|He consults for major semiconductor manufacturers such as Intel as well as the United Nations Industrial Development Organization (UNIDO). Expert's consulting client list includes: Air Products and Chemicals, AT&T, Baxter Healthcare, Digital, Hughes/GM, IBM, Intel Corporation, Menasha Corporation, Motorola, Northern Telecom, Control Data Corporation, Rosemount Engineering, Fellows Corporation, and others. In addition, he has a broad knowledge of PMOS, NMOS, CMOS, and fabrication technology.|
|German||Has a rough knowledge of German.|
|French||Has a rough knowledge of French.|
Fields of Expertise
semiconductor device manufacturing, gas trace analysis, microelectronics science, semiconductor material processing, advanced material processing, contamination control, clean room, ultra high purity, pilot line, wedge bonding, gate oxide, defect control, mass spectroscope, thin-film processing, instrumentation (equipment), clean room contamination detection, clean room design, micro electrical-mechanical system, temperature sensor, thin-film technology, electrical insulation material, complementary metal-oxide semiconductor device, complementary metal-oxide semiconductor integrated circuit, group IVA element, flow-injection analysis, very large-scale integration, vacuum measurement, ion implantation, very high-speed integration, gas analysis, vacuum system, negative metal-oxide semiconductor material, positive metal-oxide semiconductor material, metal-oxide semiconductor material, gallium arsenide semiconductor, construction, X-ray diffraction analysis, vacuum deposition, phase equilibrium, semiconductor ion implantation, zone melting, ultra-high vacuum, transistor, thin film, thin-film capacitor, sputter deposition, semiconductor device, photoresist, ultraviolet lithography, passive solid-state component, optical microscope, non-crystalline structure, microlithography, microcontamination control, mass spectrometry, interphase diffusion, epitaxial reactor, electronics manufacturing, electron microscopy, solid electric property, solid diffusion, crystalline structure, construction safety, chemical equilibrium, bipolar integrated circuit