## Expert Details

# Expert in Physics, Optics, Applied Mathematics, Algorithm Development, Electromagnetics, Quantum Theory

**Expert ID: 725848**Connecticut, USA

Spent 30 years working on all aspects of microlithographic chip fabrication. Everything from the design and development of lithographic tools, systems and subsystems to the analysis, simulation and optimization of lithographic fabrication techniques and processes. Worked at the Center for Nanoscale Science and Technology at the National Institute of Standards and Technology where I did design, development, analysis, simulation and modeling of essentially anything nano: nanotechnology, nanometrology, nanofabrication, nanoscience, etc. This covered such things as DNA origami binding to quantum dots as nanofabrication technique, the statistical limitations of block copolymer selfassembly for the semiconductor industry, the quantum mechanics of vortex electron beams and it's application to nanometrology, the optimal scan path for laser tracking of fluourescent nanoparticles and the statistics of patterning at EUV (13.5 nm) wavelengths for semiconductor chip fabrication.

He has spent over 20 years developing algorithms for performing optical and electromagnetic modeling and analysis in all areas of optics including diffraction, polarized diffraction, coherent and partially coherent imaging, interferometry, aberrations, flare, statistical optics, scattering, guided waves, surface plasmons, fiber optics, laser beam propagation and quantum optics. He has used propagators and Greens functions, including Feynman path integrals to compute diffraction in interferometric systems, laser doppler systems and gradient index optics. He has written exact electromagnetic solvers based on various techniques such as RCWA and eigenmode expansions for computing the scattering and diffraction from structured materials such as layered gratings, semiconductor wafers and optical masks.

He spent two years at Bell Labs working on the projection ebeam lithography tool know as SCALPEL. There he performed modeling, analysis and design in all aspects of the SCALPEL tool and on electron-beam lithography in general.

He performed diffraction and physical optics analysis of laser interferometry for an optical metrology company. The analysis included the effects of turbulence and helped the company improve their interferometers. He worked on the development of E&M simulation code for computing the topography of a structure from scanning white light interferometry signals. This analysis showed how to improve the translation of measured interferometry data into a surface topography map.He determined the origin, parametric dependencies and impact of speckle in projection imaging systems and it's impact on semiconductor chip fabrication. He derived from first principles a model which describes the origin and parametric scaling laws for line edge roughness in patterns produced in a chemically amplified photoresist during standard lithographic fabrication of computer and memory chips. This scaling law shows that lithographic resolution, line edge roughness and resist sensitivity are coupled in such a way that decreasing any two of those parameters requires the third to increase when the feature size is fixed. Unfortunately progress in chip fabrication requires that all three decrease simultaneously. The impossibility of simultaneous decrease of all three parameters is now know in the industry as the "RLS triangle" or more colloquially as "the triangle of death".He performed system engineering analysis of the effect of gas and fluid flow at low Knudsen numbers on heat transfer properties of structure.

**Expert may consult nationally and internationally, and is also local to the following cities:**
New York, New York - Yonkers, New York - Newark, New Jersey - Jersey City, New Jersey - Paterson, New Jersey - Bridgeport, Connecticut - New Haven, Connecticut - Worcester, Massachusetts - Springfield, Massachusetts - Providence, Rhode Island

### Education

Year | Degree | Subject | Institution |
---|---|---|---|

Year: 1981 | Degree: PhD | Subject: Theoretical/Mathematical Physics | Institution: Penn State |

Year: 1973 | Degree: BS | Subject: Physics | Institution: Penn State |

### Work History

Years | Employer | Title | Department | Responsibilities |
---|---|---|---|---|

Years: 2013 to Present | Employer: Undisclosed | Title: Owner | Department: | Responsibilities: Analysis, modeling simulation of nanotechnology, nanometrology, nanofabrication and nanoscience. Design and development of nanoscale tools, processes and metrology techniques. |

Years: 2009 to 2012 | Employer: National Institute of Standards and Technology | Title: Physicist | Department: Center for Nanoscale Science and Technology | Responsibilities: Analysis modeling and simulation of nanotechnology, nanometrology, nanofabrication, and nanoscience. Design and development of nanoscale tools, processes and metrology techniques. |

Years: 2005 to 2009 | Employer: Applied Math Solutions, LLC | Title: Owner | Department: | Responsibilities: He is a consultant in applied mathematics, applied physics and applied optics with expertise in nanotechnology, nanometrology and nanofabrication. |

Years: 2000 to 2005 | Employer: IBM, TJ Watson Research Center | Title: Research Scientist | Department: TCAD | Responsibilities: He was responsible for analysis and modeling of all aspects of semiconductor fabrication. |

Years: 1998 to 2000 | Employer: Bell Labs, Lucent Technologies | Title: Member of Technical Staff | Department: | Responsibilities: He was responsible for design, analysis and modeling of the various sub-systems of the projection e-beam lithoghraphy tool called SCALPEL |

Years: 1990 to 1998 | Employer: SVG Lithography | Title: Senior Physicist | Department: | Responsibilities: He was responsible for the design, analysis and modeling of the optical lithography tools. |

Years: 1984 to 1990 | Employer: Hughes Danbury Optical Systems | Title: Senior Researcher | Department: | Responsibilities: He was responsible for analysis and modeling of optical and laser systems. |

Years: 1982 to 1984 | Employer: Fairfield University | Title: Assistant Professor of Physics | Department: | Responsibilities: He taught introductory and advanced physics courses. |

### International Experience

Years | Country / Region | Summary |
---|---|---|

Years: to Present | Country / Region: Japan | Summary: He consulted for a Japanese lithography company. |

Years: to Present | Country / Region: China | Summary: He consulted for a Chinese semiconductor equipment manufacturer. |

### Career Accomplishments

Associations / Societies |
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He is a member of the American Physical Society. |

Publications and Patents Summary |
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He has over 15 patents in all areas of semiconductor fabrication ranging from modeling and analysis to subsystem designs. |

### Additional Experience

Training / Seminars |
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Taught a 3 Day course on statistical optics and speckle and it's impact on semiconductor fabrication. Taught a 1/2 day course on the causes and mitigation of line edge roughness (LER) in photoresist and its impact on semiconductor manufacturing. . |

Marketing Experience |
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Extensive experience and background in the area of semiconductor fabrication, lithography and lithographic simulation and hardware and nanoscale science and technology including nanometrology and nanofabrication. |

Other Relevant Experience |
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Expertise in physics, math and engineering. Can attack, analyse and solve real world problems that do not fall into the standard engineering categories of electrical, mechanical, etc, but rather lie at the intersection of various disciplines. |

### Language Skills

Language | Proficiency |
---|---|

Spanish | He is reasonably fluent in Spanish. |

Japanese | He speaks a little Japanese. |

Mandarin | He speaks a little Mandarin. |

### Fields of Expertise

applied mathematics, microlithography, nanofabrication, nanomanufacturing, nanostructure, nanotechnology, beam optics, Doppler laser radar, electric field theory, electromagnetic field, electromagnetic radiation, electromagnetics, electromagnetism, optics, physical optics, electron-beam lithography, nanomaterial, nanowire growth, carbon nanotube, electron optics, nanopowder, nanoparticle, nanowire, amplified spontaneous emission, Airy disk, calcium fluoride, absolute refractive index, brightness, bright-field image, Brewster's angle, atmospheric optics, alignment laser, microelectronics optics, semiconductor wafer processing, quantum statistics, exciton, coherent radiation, laser optics, space optics, data correlation, electric potential, semiconductor laser, thin-film optics, coherent laser, apodizer, applied statistics, semiconductor material processing, accuracy, continuous wave laser, continuous distribution function, binomial mathematical distribution, interferometer, probability, electric current, tunable laser, statistics, retroreflection, pulsed laser, non-linear optics, laser, integrated optics, geometrical optics, fiber optics, electrostatics, magnetism, electric breakdown, discrete distribution function, curve fitting, coherent optics, birefringence