Expert Details
Surface Technology, Coatings, Thin Film Deposition, PVD, Physical Vapour Deposition, Sputtering, PLD
ID: 727451
Austria
During his work, he was focusing on:
- coating materials:
common coating metals, their nitrides, oxides and carbonitrides (Ti, Cr, Zr, Si, V, W, Al, TiAl, Ag, Au, Pd, Cu, Mn, DLC (C))
- coating processes:
PVD like magnetron sputtering (RF, DC, pulsed), pulsed laser deposition, arc and electron beam evaporation, ion-assisted deposition
ion pretreatment from plasma etching to ion beam etching and deposition
PACVD (PECVD)
plasma polymerization
- coating characterization and coating properties:
adhesion, thickness, optical appearance and opto-electronic properties, tribological properties (wear, friction), corrosion, biomedical properties (cell and protein adhesion, bacteria adhesion), gas permeation, etc.
- coating application:
tribology, biomedical (implants, medical devices), corrosion-protection, optics and opto-electronics, decoration, gas barriers, etc.
Austrian company working in the field of rare metals: Corrosion protectionUS company working in the field of ion sources: Development of new sources and processes.German company working in the field of carbon-fibre reinforced polymer production: Possibilities for new surface treatments
Education
| Year | Degree | Subject | Institution |
|---|---|---|---|
| Year: 2006 | Degree: Prof. | Subject: biomaterials | Institution: Polish Academy of Sciences, Krakow |
| Year: 2004 | Degree: PhD | Subject: materials sciences - surface technology | Institution: University of Leoben, Austria |
| Year: 2001 | Degree: Dipl.-Ing. (Master of Sciences) | Subject: materials sciences | Institution: University of Leoben, Austria |
Work History
| Years | Employer | Title | Department |
|---|---|---|---|
| Years: 2004 to Present | Employer: Undisclosed | Title: Scientific and technological group leader | Department: Laser Center Leoben |
Responsibilities:Strategic market research in thin filmsVacuum deposition processes (technology) Coating materials and coating applications |
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| Years | Employer | Title | Department |
| Years: 2001 to 2004 | Employer: University of Leoben / Materials Center Leoben | Title: Material Scientist | Department: Physical Metallurgy |
Responsibilities:Development of thin films and deposition processesConstruction of deposition equipment Characterization of thin films Simulation of thin film behaviour |
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International Experience
| Years | Country / Region | Summary |
|---|---|---|
| Years: 2005 to Present | Country / Region: Poland | Summary: |
Career Accomplishments
| Associations / Societies |
|---|
| AVS, SVC, ESB |
| Publications and Patents Summary |
|---|
| ~ 100 publications in peer-reviewed journals (natural sciences) ~ 10 publications in peer-reviewed journals (economic sciences) 3 books on thin films and thin film deposition |
Additional Experience
| Expert Witness Experience |
|---|
| Applied scientific knowledge with high focus on industry R&D, High knowledge of thin film patents |
| Training / Seminars |
|---|
| Courses for material characterization in physical metallurgy (thin films) |
| Vendor Selection |
|---|
| Europe, US |
| Marketing Experience |
|---|
| Has a variety of contacts to industrial partners (EU, US) in the fields of vacuum and deposition equipment, tribological coatings, biomedical coatings (biocompatible coatings), market research |
| Other Relevant Experience |
|---|
| High scientific knowledge in deposition of coatings at room temperature, Coating of polymer substrates and processes connected to coatings of soft substrates with hard coatings |
Language Skills
| Language | Proficiency |
|---|---|
| English | Often and generally used during work |
Fields of Expertise
activated reactive evaporation, deposition, dielectric film, ion-beam etching, low-energy ion beam thin-film deposition, material wear, physical vapor deposition, plasma cleaning, plasma surface treatment, plasma-enhanced chemical vapor deposition, selective deposition, substrate, surface chemistry, surface oxide, surface treatment, thin film, thin-film analysis, thin-film application, thin-film coating adhesion, thin-film coating process, thin-film deposition, thin-film mechanical property, thin-film property, thin-film stress, thin-film technology, titanium nitride thin film, tribology, vacuum deposition, vacuum deposition equipment, vacuum equipment, vacuum outgassing, vacuum technology, vapor deposition, wear effect, wear prevention, wear resistance, wear testing, wear-resistant coating material, thin-film head, carbide wear-resistant coating material, piston wear-resistant coating material, piston coating material, black thin film, membrane material, metal alloy wear resistance, lubricant coating material, chemical vapor deposition reactor, iron thin film, superhard coating synthesis, superhard coating material, superhard material, hybrid electronic equipment, abrasion testing, ion vapor deposition, dielectric isolation, high-energy electron diffraction, electric resistivity, aluminum deposition, surface alloying, diamond coating material, directional coupler, thin-film processing, optical thin-film metrology, refractory compound, thermal plasma chemical vapor deposition, zirconium oxide, thin-film licensing, semiconductor material manufacturing, thin-film thermal property, oxidation reaction, interconnect substrate, semiconductor material processing, thin-film strain gage transducer, abrasion-resistant coating material, abrasion, transparent conductive thin film, plasma polymerization, metal-oxide semiconductor material, thin-film electrical property, thin-film circuit element, gas plasma, oxygen, refractory ceramic, thick film, silicon oxide, silicon dioxide, silicon, semiconductor processing equipment, optical thin film, metallizing, integrated optics, electric resistance, diamond thin film, chemical vapor deposition, ceramic thin film, arc deposition, aluminum oxide